Development of Localized Plasma Etching System for Failure Analyses in Semiconductor Devices: (4)Precise Temperature Measured during Plasma Etching
نویسندگان
چکیده
منابع مشابه
Pulsed plasma etching for semiconductor manufacturing
Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching rate, better uniformity, and less structural, electrical or radiation (e.g. vacuum ultraviolet) damage. Pulsed plasmas can also ameliorate unwanted artefacts in etched micro-features such as notching, bowing, micro-trenching ...
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ژورنال
عنوان ژورنال: Journal of the Vacuum Society of Japan
سال: 2012
ISSN: 1882-4749,1882-2398
DOI: 10.3131/jvsj2.55.176